robmorin0-hash/multibeam-ebl-open

Open architecture multi-beam direct-write electron-beam lithography — Morin 2026 v5. CC BY 4.0 papers + MIT code. Sub-10 nm capable, ~$37M/tool vs EUV $200-400M, multi-vendor supply chain, no patent claims.

语言：TeX · GitHub 星标：6 · Fork：1

在 GitHub 上查看原仓库